Silica Nanoparticles

Highly Monodisperse Silica Particles for Advanced Applications

Our monodisperse silica particles (SiO₂) are manufactured using a refined process to ensure exceptional spherical uniformity, narrow particle size distribution (CV: 2–3%), and high chemical stability. Available in sizes ranging from 100 nm to 300 nm, these non-porous silica spheres provide a reliable basis for a wide range of cutting-edge scientific, industrial, and biotechnological applications.

Featuring a naturally hydrophilic surface, high thermal resistance (up to 1000 °C), and excellent mechanical rigidity, our silica nanoparticles serve as ideal building blocks for photonics, template synthesis, and calibration standards. Furthermore, their chemically inert and biocompatible nature makes them a preferred choice for nucleic acid (DNA/RNA) extraction, protein purification, and diagnostic assay development.

Monodisperse Silica Particles in Biotechnology

Monodisperse silica particles with a narrow size distribution are essential high-performance materials for modern biotechnological and biomedical applications.

• Nucleic Acid Extraction (DNA/RNA): The large specific surface area of nanoparticles ranging from 100 nm to 300 nm enables highly efficient and reproducible binding of DNA and RNA.
• Protein Purification: Chemically inert, spherical silica carriers serve the targeted isolation and purification of proteins from complex biological matrices.
• Diagnostic Assays: Thanks to their precisely defined shape and round structure, they are perfectly suited as stable carrier materials in the development of biosensors and immunoassays.
• Analytical Standards: Their high monodispersity also predestines them as reliable calibration standards in laboratory medicine and analytics.

Monodisperse Silica Particles in Colloidal Template Synthesis

In modern materials science and nanotechnology, monodisperse silica particles are indispensable building blocks for template synthesis. Thanks to their precise spherical shape and narrow size distribution (CV: 2–3 %), they enable the targeted production of highly ordered nanostructured materials.

• Self-Assembly into Colloidal Crystals: The monodisperse silica spheres self-assemble into three-dimensional, periodic lattices that serve as perfect nanostructures (templates).
• Infiltration of Interstices: The interstitial spaces of these particle lattices can be precisely filled with polymers, metals, semiconductors, or metal oxides.
• Creation of Inverse Opals: Following the selective removal of the silica template (sacrificial template), so-called inverse opals with precise, periodic nanoporosity are formed.
• Innovative Applications: These customized structures form the ideal foundation for photonic crystals, highly efficient sensors, catalyst supports, and optical filters.

Silica Particles in Chemical-Mechanical Polishing (CMP)

In the semiconductor industry and precision optics, chemical-mechanical polishing (CMP) is an indispensable process step for producing extremely smooth, planar surfaces on silicon wafers, glass, or metals.

• Non-Porous Structure & Hardness: The non-porous and mechanically robust nature of the silica particles provides the necessary abrasive action without uncontrollably damaging the substrate.
• Prevention of Micro-Scratches: Thanks to the narrow particle size distribution (CV: 2–3 %) and the perfectly round shape, the formation of surface or deep scratches during the polishing process is minimized.
• Chemical Reactivity: The silanol group-rich surface of the silica spheres interacts optimally with the chemical components of the polishing suspension (slurry), enabling a precise material removal rate.
• Precise Polishing: They are ideally suited as a high-performance component in polishing slurries for advanced manufacturing and optical components.